Search results for "chemical vapor deposition"

showing 10 items of 199 documents

Phosphorous doping and drawing effects on the Raman spectroscopic properties of O=P bond in silica-based fiber and preform.

2012

International audience; We report an experimental study of the doping and drawing effects on the Raman activities of phosphorus (P)-doped silica-based optical fiber and its related preform. Our data reveal a high sensitivity level in the full width at half maximum value of the 1330 cm−1 (O = P) Raman band to the P-doping level. Its increase with the P doping level does not clash with an increase in the disorder of the O = P surrendering matrix. In addition, we observe that in the central core region of the sample (higher doping level), the drawing process decreases the relative band amplitude. We tentatively suggest that this phenomenon is due to the change in the first derivate of the bond…

(060.2310) Fiber optics; (300.6450) Spectroscopy Raman; (160.2750) Glass and other amorphous materials; (060.2280) Fiber design and fabrication; (060.2290) Fiber materials.inorganic chemicalsMaterials scienceOptical fiberAnalytical chemistryChemical vapor depositionlaw.inventionCondensed Matter::Materials Sciencesymbols.namesakeOpticslawPolarizabilityCondensed Matter::SuperconductivityFiber[PHYS.PHYS.PHYS-OPTICS]Physics [physics]/Physics [physics]/Optics [physics.optics]business.industryDopingtechnology industry and agricultureFiber optics Spectroscopy Raman Glass and other amorphous materials Fiber design and fabrication Fiber materialsElectronic Optical and Magnetic MaterialsFull width at half maximumsymbolsbusinessRaman spectroscopyhuman activitiesRaman scattering
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Color Sensitive Response of Graphene/Graphene Quantum Dot Phototransistors

2019

We present the fabrication and characterization of all-carbon phototransistors made of graphene three terminal devices, coated with atomically precise graphene quantum dots (GQD). Chemically synthesized GQDs are the light absorbing materials, while the underlying chemical vapor deposition (CVD)-grown graphene layer acts as the charge transporting channel. We investigated three types of GQDs with different sizes and edge structures, having distinct and characteristic optical absorption in the UV–vis range. The photoresponsivity exceeds 106 A/W for vanishingly small incident power (<10–12 W), comparing well with state of the art sensitized graphene photodetectors. More importantly, the photor…

---Materials scienceAbsorption spectroscopybusiness.industryGraphenePhotodetector02 engineering and technologyChemical vapor deposition010402 general chemistry021001 nanoscience & nanotechnology01 natural sciencesGraphene quantum dot0104 chemical sciencesSurfaces Coatings and FilmsElectronic Optical and Magnetic Materialslaw.inventionResponsivityGeneral EnergyQuantum dotlawOptoelectronicsPhysical and Theoretical Chemistry0210 nano-technologybusinessAbsorption (electromagnetic radiation)
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Structural and morphological characterization of the Cd-rich region in Cd1-xZnxO thin films grown by atmospheric pressure metal organic chemical vapo…

2019

Abstract We have analysed the growth, morphological and structural characterization of Cd1-xZnxO thin films grown on r-sapphire substrates by atmospheric pressure metal organic chemical vapour deposition, mainly focusing on the Cd-rich rock-salt phase for its promising optical and technological applications. The evolution of the surface morphology and crystalline properties as a function of Zn content has been studied by means of high resolution x-ray diffraction and electron microscopy techniques. Monocrystalline (002) single-phase cubic films were obtained with Zn contents up to 10.4%, and with a low density of dislocations as a consequence of the optimized crystal growth process. Particu…

010302 applied physicsMaterials scienceAtmospheric pressureAlloyMetals and AlloysCrystal growth02 engineering and technologySurfaces and InterfacesChemical vapor depositionengineering.material021001 nanoscience & nanotechnology01 natural sciencesSurfaces Coatings and FilmsElectronic Optical and Magnetic MaterialsMonocrystalline siliconChemical engineeringPhase (matter)0103 physical sciencesMaterials ChemistryengineeringThin film0210 nano-technologyWurtzite crystal structureThin Solid Films
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Characteristics of industrially manufactured amorphous hydrogenated carbon (a-C:H) depositions on high-density polyethylene

2016

Industrially high-density polyethylene (HDPE) was successively covered by two types of amorphous hydrogenated carbon (a-C:H) films, one more flexible (f-type) and the other more robust (r-type). The films have been grown by radio frequency plasma-enhanced chemical vapor deposition (RF-PECVD) technique with acetylene plasma. The surface morphology of both types has been studied by atomic force microscopy (AFM) and scanning electron microscopy (SEM). Contact angle measurements and Raman spectroscopy analysis were done to investigate the surface wettability and carbon chemical composition. Both types display similar morphology and grain growth pattern. Contact angle measurements revealed surfa…

010302 applied physicsMaterials scienceChemistry (all)Settore FIS/01 - Fisica Sperimentalechemistry.chemical_elementNanotechnology02 engineering and technologyGeneral ChemistryChemical vapor depositionPolyethylene021001 nanoscience & nanotechnology01 natural sciencesAmorphous solidContact angleGrain growthchemistry.chemical_compoundCarbon filmAmorphous carbonChemical engineeringchemistry0103 physical sciencesGeneral Materials Science0210 nano-technologyCarbon
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X-Ray studies on optical and structural properties of ZnO nanostructured thin films

2006

Abstract X-ray absorption near-edge fine structure (XANES) studies have been carried out on nanostructured ZnO thin films prepared by atmospheric pressure chemical vapour deposition (APCVD). Films have been characterized by X-ray diffraction (XRD) and optical luminescence spectroscopy exciting with laser light (PL) or X-ray (XEOL). According to XRD measurements, all the APCVD samples reveal a highly (002) oriented crystalline structure. The samples have different thickness (less than 1 μm) and show significant shifts of the PL and XEOL bands in the visible region. Zn K-edge XANES spectra were recorded using synchrotron radiation at BM08 of ESRF (France), by detecting photoluminescence yield…

010302 applied physicsMaterials sciencePhotoluminescencebusiness.industryX-rayAnalytical chemistrySynchrotron radiation02 engineering and technologyChemical vapor deposition021001 nanoscience & nanotechnologyCondensed Matter Physics01 natural sciencesXANESOptics0103 physical sciencesGeneral Materials ScienceElectrical and Electronic EngineeringThin film0210 nano-technologybusinessLuminescenceSpectroscopy
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Rock-salt CdZnO as a transparent conductive oxide

2018

Transparent conducting oxides (TCOs) are widely used in applications from solar cells to light emitting diodes. Here, we show that the metal organic chemical vapor deposition (MOCVD)-grown, rock-salt CdZnO ternary, has excellent potential as a TCO. To assess this compound, we use a combination of infrared reflectance and ultraviolet-visible absorption spectroscopies, together with Hall effect, to determine its optical and electrical transport characteristics. It is found that the incorporation of Zn produces an increment of the electron concentration and mobility, yielding lower resistivities than those of CdO, with a minimum of 1.96 × 10 − 4 Ω · cm for a Zn content of 10%. Moreover, due to…

010302 applied physicsMaterials sciencePhysics and Astronomy (miscellaneous)Band gapAnalytical chemistry02 engineering and technologyChemical vapor deposition021001 nanoscience & nanotechnology01 natural scienceslaw.inventionlaw0103 physical sciencesMetalorganic vapour phase epitaxy0210 nano-technologyTernary operationAbsorption (electromagnetic radiation)Deposition (law)Transparent conducting filmLight-emitting diodeApplied Physics Letters
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Optimization of physicochemical and optical properties of nanocrystalline TiO 2 deposited on porous silicon by metal-organic chemical vapor depositio…

2020

International audience; Titanium dioxide (TiO2) is very employed in solar cells due to its interesting physicochemical and optical properties allowing high device performances. Considering the extension of applications in nanotechnologies, nanocrystalline TiO2 is very promising for nanoscale components. In this work, nanocrystalline TiO2 thin films were successfully deposited on porous silicon (PSi) by metal organic chemical vapor deposition (MOCVD) technique at temperature of 550°C for different periods of times: 5, 10 and 15 min. The objective was to optimize the physicochemical and optical properties of the TiO2/PSi films dedicated for photovoltaic application. The structural, morphologi…

010302 applied physicsMaterials sciencePolymers and PlasticsMetals and Alloys02 engineering and technologyChemical vapor deposition021001 nanoscience & nanotechnologyPorous silicon01 natural sciences7. Clean energyNanocrystalline materialSurfaces Coatings and FilmsElectronic Optical and Magnetic MaterialsBiomaterialsMetalChemical engineeringvisual_art0103 physical sciencesvisual_art.visual_art_medium[INFO]Computer Science [cs]Metalorganic vapour phase epitaxy0210 nano-technology[CHIM.CHEM]Chemical Sciences/Cheminformatics
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Induced crystallographic changes in Cd1−xZnxO films grown on r-sapphire by AP-MOCVD: the effects of the Zn content when x ≤ 0.5

2020

High-resolution X-ray diffraction, scanning electron microscopy and transmission electron microscopy techniques were used to investigate, as a function of the nominal Zn content in the range of 0–50%, the out-of-plane and in-plane crystallographic characteristics of Cd1−xZnxO films grown on r-plane sapphire substrates via atmospheric pressure metal–organic chemical vapor deposition. The study is conducted to search for knowledge relating to the structural details during the transition process from a rock-salt to a wurtzite structure as the Zn content increases in this CdO–ZnO system. It has been found that it is possible to obtain films exhibiting a single (001) cubic orientation with good …

010302 applied physicsMaterials scienceScanning electron microscope02 engineering and technologyGeneral ChemistryChemical vapor deposition021001 nanoscience & nanotechnologyCondensed Matter Physics01 natural sciencesCrystallographyTransmission electron microscopy0103 physical sciencesSapphireGeneral Materials ScienceOrthorhombic crystal systemCrystalliteMetalorganic vapour phase epitaxy0210 nano-technologyWurtzite crystal structureCrystEngComm
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Atomic Layer Deposition of Osmium

2011

Growth of osmium thin films and nanoparticles by atomic layer deposition is described. The Os thin films were successfully grown between 325 and 375 °C using osmocene and molecular oxygen as precursors. The films consisted of only Os metal as osmium oxides were not detected in X-ray diffraction measurements. Also the impurity contents of oxygen, carbon, and hydrogen were less than 1 at % each at all deposition temperatures. The long nucleation delay of the Os process facilitates either Os nanoparticle or thin film deposition. However, after the nucleation delay of about 350 cycles the film growth proceeded linearly with increasing number of deposition cycles. Also conformal growth of Os thi…

010302 applied physicsMaterials scienceta114General Chemical EngineeringInorganic chemistryAnalytical chemistryNucleationchemistry.chemical_element02 engineering and technologyGeneral ChemistryChemical vapor deposition021001 nanoscience & nanotechnologyOsmocene01 natural scienceschemistry.chemical_compoundAtomic layer depositionCarbon filmchemistry0103 physical sciencesMaterials ChemistryDeposition (phase transition)OsmiumThin film0210 nano-technologyta116Chemistry of Materials
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Radiation resistance of nanolayered silicon nitride capacitors

2020

Abstract Single-layered and multi-layered 20–60 nm thick silicon nitride (Si3N4) dielectric nanofilms were fabricated using a low-pressure chemical vapour deposition (LPCVD) method. The X-ray photoelectron spectroscopy (XPS) confirmed less oxygen content in the multi-layered nanofilms. The capacitors with Si3N4 multilayer demonstrated a tendency to a higher breakdown voltage compared to the capacitors with Si3N4 single layer. Si3N4 nanofilms and capacitors with Si3N4 dielectric were exposed to 1 kGy dose of gamma photons. Fourier transform infrared (FTIR) spectroscopy analysis showed that no modifications of the chemical bonds of Si3N4 were present after irradiation. Also, gamma irradiation…

010302 applied physicsNuclear and High Energy PhysicsMaterials sciencebusiness.industry02 engineering and technologyDielectricChemical vapor deposition021001 nanoscience & nanotechnology01 natural sciencesCapacitancelaw.inventionchemistry.chemical_compoundCapacitorSilicon nitridechemistrylaw0103 physical sciencesOptoelectronicsBreakdown voltageIrradiation0210 nano-technologybusinessInstrumentationRadiation resistanceNuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms
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